Spin Coating
THE SOLUTION FOR LABORATORY
COAT AND DEVELOP PROCESSES
SUSS MicroTec‘s LabSpin platform represents the latest generation of manual coater/developer systems developed specifically for laboratory and R&D.
Designed for a variety of photolithographical chemicals, the LabSpin process station provides uniform, precise and repeatable coating results thanks to its advanced process chamber design.
- Description
- Additional information
Description
HIGHLIGHTS
Removable bowl for quick changeover between different processes, avoiding cross contamination
Directly-coupled hollow shaft motor with a transparent liquid separator on the vacuum line
Drain bottle in front panel for easy access and monitoring of the waste level
Adjustable dispense position
Edge bead removal available
Puddle development supported by chuck oscillation for reduced development time
| TOOL CONFIGURATIONS | LabSpin6 | Up to 150 mm round or 4″ square substrates |
| LabSpin8 | Up to 200 mm round or 6″ square substrates | |
| VERSIONS | Stand-Alone System | Table-top version (TT) |
| For Integration into Wet Bench | Bench-mounted version (BM) | |
| CONTROLLER | Graphical User Interface (GUI) | Touch panel with color display |
| Max. Number of Recipes | 200 | |
| Max. Number of Process Steps | 40 | |
| Programmable Step Time | 1 – 999 s | |
| Motor | Brushless EC-motor with hollow shaft and liquid separator | |
| Max. Spin Speed | 8 000 rpm +/- 1 rpm (with 200 mm chuck) | |
| Max. Acceleration | 4 000 rpm/s | |
| SAFETY | Digital Vacuum Gauge | Yes |
| Automatic Vacuum Control | Yes | |
| Closed Cover Control | Yes | |
| REQUIREMENTS | Power | 4.6 A / 2.5 A (115 V / 230 V) |
| Compressed Air | 5 – 6 bar | |
| Vacuum | min. -0.7bar (optional) | |
| Nitrogen | 5 – 6 bar (optional) | |
| DIMENSIONS* | LabSpin6/8 BM (W x D x H) | 350 x 340 x 415 mm |
| Controller (W x D x H) | 160 x 120 x 67 mm | |
| LabSpin6/8 TT (W x D x H) | 350 x 455 x 420 mm |
| Nguồn điện | 4.6 A / 2.5 A (115 V / 230 V) |
| Khí nén | 5 – 6 bar |
| Chân không | min. -0.7bar (optional) |
| Nitrogen | 5 – 6 bar (optional) |
| LabSpin6/8 BM (W x D x H) | 350 x 340 x 415 mm |
| Controller (W x D x H) | 160 x 120 x 67 mm |
| LabSpin6/8 TT (W x D x H) | 350 x 455 x 420 mm |
Applications in the field of semiconductor, MEMS, NEMS and Nano
THE SOLUTION FOR LABORATORY
COAT AND DEVELOP PROCESSES
| Main Equipment |
| Connection Accessories |
| ADVANCED COVER PLATE FOR OPTIONAL FUNCTIONS |
| SYRINGE DISPENSE SYSTEM |
| FULLY AUTOMATIC DISPENSE SYSTEM |
| EDGE COATING |
| EDGE BEAD REMOVAL (EBR) |
| DEVELOPER DISPENSE SYSTEM |
| NITROGEN DRYING |
| FOOT SWITCH |
| Control and SOFTWARE | Touch panel with color display |
Additional information
| Manufacturer | Suss |
|---|---|
| Origin | Germany |
| Type | Manual |